PHOTOLITHOGRAPHY PROCESS ENGINEER/METROLOGY APPLICATION ENGINEER
Twenty years of experience in photolithography area as process and metrology engineer with strong skills in overlay and CD-SEM tools and automatic process control. Strong industrial engineering skills and management of production processes.
Experience in SPC and APC using Run-to-Run feedback technique, sampling and analysis of measurement systems (MSA), integrated process and controlled conversion of production processes.
Proven skills in Project Management, Process Mapping e Business Process Improvement. Throughout my professional career, I worked also to manage and define the operating procedures for quality using the Lean-Six-Sigma principles and monitor the external audit ensuring the correct alignment with the standards prescribed by the ISO 9001 and ISO-TS 16949 requirements, and managing any non-compliance. Interested in evaluating proposals for semiconductor industrial environments as well as in the design company and available for transfering in Europe.
Accomplishments
Developed an Automatic Process Control for overlay compensation based on a Run to Run model and an adaptive Esponential Weigthed Moving Average algorithm
Developed a buissness process for the in-line sample, maximizing the metrology tools utilization while minimizing the risk of an non detected OOS for product.
Developed a statistical analysis tool for CD SEM tool, VBA excel based
Designed and developed a relational database in MS Access for CD-SEM recipe setup data collection
Skills
Photolithography expert,
Statistical process control
Sampling optimization
CD SEM metrology
Process Business Improvement
Quality assurance
Measurement System Analysis expert
Work Experience
Process Staff Engineer, 04/2013 to Current – , ,
LFoundry S.r.l. (from 2013 up to now) customer-specific manufacturer of semiconductor devices] In photolithography technology area Responsible for the measurement systems and automatic process controls.
In my current role I am working on BKM and continuous improvement for the measurement techniquesì and reliability, quality assurance.
Responsible for defining the "scribe lane" standardization, in particular for the CD-SEM measurement structures.
Project for analysis, reduction and predicibility of cycle time of prototype under development (just-in-time shipment to the customer), with DMAIC approach as per the Lean Six-Sigma quality discipline.
Responsible for APC (automated process control) parameters optimization and its improvement.
Project and development of a relational database to collect the metrology setup data necessary to run the first silicon of the NTI/NPI devices.
Applied BPI/BPM methdologies to different internal processes of the area.
Project management: collaboration with R&D department for the study of the OPC (Optical Proximity Correction) modeling, in order to enhance the optical resolution required for the 90 nm technology node.
Senior process engineer / Lead engineer, 04/1998 to 04/2013 Dow Chemical Company – , ,
reporting to the Section Manager and supervisor of 13 people Partecipate in process transfer activity from other facilities (SDRAM devices) From Jan 1999, metrology and process engineer in shift working on CD-SEM, overlay tools, stepper CANON iline and ASML DUV scanner pas 800 tools.
Four years experience as lead engineer in shift, supervisor of a team of 13 people.
The team was responsible for equipment preventive maintenance activities, equipment uptime and quick reaction to fails, process development of new devices, SPC control, detection of process escursion and disposition of deviant material, DOE execution, follow up on safety requirements.
Safety, feedback communication, performance review, and training plan development was my main activities related to supervisor role.
In 2003, I was promoted and moved back to daily shift as CD SEM technology expert.
My main responsibilities was: Schedule preventive maintenance and equipment performance analysis (up-time, lost time, eng time, spare parts management, etc.) Follow up on new tools installation Operative procedure definition for BKM recipe making and equipment maintenance MSA (measurement system analysis) champion for ISO-TS 16949 compliance Sample champion for the dinamic sampling process efficiency Training and coaching to new hired Concept and realization of a new automatic control system, a Run-to-Run technique based on an adaptive Exponential Weigthed Moving Average algorithm.
Also, an additional algorithms to overcome the unefficiency due to the batch run was developed, as well as for start and stop material in production line.
Project management to convert the installed base of CD-SEM tools from KLA8100 to AMAT Verity SEM model.
Project execution of the best sample process following the business process management method.
Member of a project team for the double exposure technique for imager CMOS devices development.
Apply the what-if and decision-analysis methodologies to resolve a capacity problem.
The achieved goal was to avoid to buy a new CD SEM tool, getting 1.5 milion $ of cost saving.
Process Engineer, 04/1995 to 04/1998 Micron Technology Italia S.r.l – , ,
In photolithography area, reporting directly to Section Manager.
Mainly dedicated to metrology tools (KLA5100 series and CD SEM Hitachi 8300 series), I was also involved in stepper process release activities.
Responsible for VIA's process release on iLine steppers CANON for SDRAM devices (16 megabit at 350 nm technology node) Statistical process control and material disposition for several excursion issues.
Design of Experiment for process improvement, variability reduction and alignment optimization.
Follow up for metrology tools installation in occasion of the start up activity for the new 200 nm (12 inch) production line.
Database development for control chart maintenance saving around 300 working hours per year.
Education
Master of Science: Electric Engineer, Expected in 1992 - , GPA: Electric Engineer Università Politecnica delle Marche
Score: 110/110
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